The maximum size of a single chip that can be manufactured using a single exposure in the photolithography process.
It cannot be solved by simply replacing hardware because everything is optimized for the current size. Enlarging the lens or stage increases optical distortion, and the entire multi-billion dollar equipment would need to be redesigned. Additionally, since indirect solutions like stitching are available, a limit has been established instead of replacing the expensive EUV Processing equipment.

Seonglae Cho